先进纳米薄膜材料-制备方法及应用

首页 > 图书 > 科技/2020-08-02 / 加入收藏 / 阅读 [打印]
先进纳米薄膜材料-制备方法及应用

先进纳米薄膜材料-制备方法及应用

作者:林媛

开 本:32开

书号ISBN:9787122291585

定价:298.0

出版时间:2017-03-01

出版社:化学工业出版社



2.2.3 Application of Electron Beam Evaporation 43

2.2.3.1 Cooling of Electron Beam Gun 43

2.2.3.2 Evaporation of Source Materials by Electron Beam 43

2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation 44

2.2.3.4 Attention andWarning for Electron Beam Evaporation 45

2.3 Characterization of Thin Film 45

2.3.1 Surface Morphology by AFM 46

2.3.2 Thickness Measurement by Spectroscopic Ellipsometry 47

2.4 Summary 53

Acknowledgments 53

References 53



3 Nanostructures and Thin Films Deposited with Sputtering 59

Weiqing Yang

3.1 Introduction 59

3.2 Nanostructures with Sputtering 60

3.2.1 Oxide Nanostructures 61

3.2.1.1 Needle-Shaped MoO3 Nanowires 61

3.2.1.2 Bi2O3 Nanowires 64

3.2.2 Nitride Nanostructures 65

3.2.2.1 Graphitic-C3N4 Nanocone Array 65

3.2.2.2 InAlN Nanorods 68

3.3 Thin Films Deposited with Sputtering 71

3.3.1 Metal AlloyThin Films 73

3.3.1.1 LaNi5 AlloyThin Films 73

3.3.1.2 Ni–Mn–In AlloyThin Films 74

3.3.2 Composite Metal Oxide Thin Films 75

3.3.2.1 BiFeO3/BaTiO3 BilayerThin Films 75

3.4 Summary 76

Acknowledgments 77

References 77



4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81

Wen Huang

4.1 Introduction 81

4.2 Technology of MBE 82

4.2.1 The Physics of MBE 83

4.2.2 MBE Growth Mechanisms 86

4.2.2.1 Two-Dimensional (2D) MBE Growth Mechanism 87

4.2.2.2 Three-Dimensional (3D) MBE Growth Mechanism 88

4.2.2.3 Stranskie–Krastanow 3D Growth Mechanism 90

4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 91

4.3.1 Semiconducting Oxide Heterostructures Grown by Laser Molecular Beam Epitaxy 91

4.3.2 Strain-Induced Magnetic Anisotropy in Highly Epitaxial Heterostructure by LMBE 96

4.4 Quantum Dots Development with Molecular Beam Epitaxy 101

4.5 Summary 103

Acknowledgments 104

References 104



5 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105

Taisong Pan

5.1 Introduction 105

5.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 106

5.2.1 Overview of CVD Process of Carbon Nanotube Growth 106

5.2.2 Control of Carbon Nanotube Structure 108

5.2.3 The Alignment of Carbon Nanotube Array 110

5.3 Graphene Synthesis by Chemical Vapor Deposition 112

5.3.1 Overview of CVD Process of Graphene Synthesis 112

5.3.2 Control of Graphene Quality 113

5.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 115

5.4.1 Overview of CVD Process of Metal Dichalcogenides 115

5.4.2 Growth Control of Metal Dichalcogenides in Chemical Vapor Deposition 118

5.5 Summary 119

References 120



6 Nanostructures Development with Atomic Layer Deposition 123

Hulin Zhang

6.1 Introduction 123

6.2 Reaction Mechanisms 125

6.2.1 Thermal ALD 125

6.2.2 Catalytic ALD 127

6.2.3 Metal ALD 129

6.3 Nanostructures Based on ALD 131

6.3.1 Nanolaminates and Nanofilms 132

6.3.2 Nanostructures as Templates 132

6.3.3 Nanostructured Modification 135

6.4 Summary 136

Acknowledgments 137

References 138



7 Nanomaterial Development with Liquid-Phase Epitaxy 141

Weiqing Yang

7.1 Introduction 141

7.2 Hydrothermal Method 142

7.2.1 Development of Hydrothermal Method 142

7.2.2 Microwave-Assisted Hydrothermal Method 143

7.2.2.1 Microwave-Assisted Preparation of Nanostructures in Aqueous Solution 144

7.3 Nanostructures Fabricated Using LPE 147

7.3.1 Core–Shell Structures 147

7.3.2 The Epitaxial Preparation Methods of Core–Shell Structures 148

7.3.2.1 General Nanochemical Approaches to Prepare Epitaxial Core–Shell UCNPs with a Single Shell Layer 150

7.3.2.2 Layer-by-Layer Approach to Prepare Core–Multishell UCNPs with MonolayerThickness Precision 153

7.3.2.3 Mesoporous Silica Coating 153

7.3.2.4 Coupling of UCNPs with Plasmonics Using Core–Shell Architecture 154

7.4 Summary 156

Acknowledgments 156

References 156

 2/4   首页 上一页 1 2 3 4 下一页 尾页

工业技术 一般工业技术

在线阅读